-
1. In the manufacturing process, beam masking is used to protect the wafer during the etching step.
在制造过程中，光束掩模用于在蚀刻步骤中保护晶片。
-
2. The beam masking technique is crucial for achieving high resolution in lithography.
光束掩模技术对于实现光刻的高分辨率至关重要。
-
3. During the fabrication of integrated circuits, beam masking is often used to control the placement of metal lines.
在集成电路的制造过程中，光束掩模通常用于控制金属线的放置位置。