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1. The doped oxide diffusionprocess is crucial for the fabrication ofsemiconductor devices.
掺杂氧化物扩散过程对于半导体器件的制造至关重要。
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2. The doped oxide diffusion techniquehas been widely used in thefield of electronics.
掺杂氧化物扩散技术在电子领域得到了广泛应用。
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3. The dopedoxide diffusion process is essential for theoptimization of device performance.
掺杂氧化物扩散过程对于优化器件性能至关重要。