high-pressure chemical vapor deposition

例句：

1. 1. This process is used for depositing thin films on a substrate with high-pressure chemical vapor deposition.
   这个过程用于在高压力化学气相沉积的衬底上沉积薄膜。
2. 2. The technology of high-pressure chemical vapor deposition has been widely applied in the fieldof semiconductor manufacturing.
   高压化学气相沉积技术已被广泛应用于半导体制造领域。
3. 3.High-pressure chemical vapor deposition is an important technique for fabricating microelectronic devices.
   高压化学气相沉积是制造微电子器件的重要技术。