名词
中文翻译：离子束蚀刻
同义词：
['ion-beam etching', 'ion milling', 'ion-assisted etching']
例句：
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1. Ion beametching is a technique used in semiconductor manufacturing to remove unwanted material from the surface of integrated circuits.
离子束蚀刻是一种在半导体制造中用于从集成电路表面去除不需要的材料的技术。
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2.In ion beam etching, an ion beam is directed at the sample and causes it to be etched away.
在离子束蚀刻中，离子束被导向样本并导致其被蚀刻掉。
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3.The process of ion beam etching can be used to create precise patterns on microchips.
离子束蚀刻过程可用于在微芯片上创建精确图案。