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1.The photomask set was used to create the microchip.
光刻掩模组被用来制造微芯片。
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2.The process of creating a photomask set is complex and requires expertise.
制作光刻掩模组的过程复杂且需要专业知识。
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3.The photomask set was designed to be easily replaceable, reducing downtime.
光刻掩模组设计为易于更换,减少停机时间。