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1. The photoresist flow was carefully controlled to ensure the accuracy of the pattern.
光刻胶流动被小心控制，以确保图案的准确性。
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2. During the photoresist flow process, the developer is applied to the resist layer.
在光刻胶流动过程中，显影剂被施加到抗蚀层上。
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3. The photoresist flow is crucial for achieving high resolution and minimizing defects in the final device.
光刻胶流动对于实现高分辨率和最终器件中最小化缺陷至关重要。