名词
中文翻译：等离子化学气相沉积
同义词：
['plasma CVD', 'plasma CVD process', 'plasma CVD technique']
例句：
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1. The plasma CVD process is used to deposit thin films on silicon wafers.
等离子化学气相沉积工艺用于在硅晶片上沉积薄膜。
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2. The plasma CVD process is widely used in the manufacturing of semiconductor devices.
等离子化学气相沉积工艺广泛应用于半导体器件的制造中。
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3.The plasma CVD process has been found to be effective in improving the quality of metallization layers.
等离子化学气相沉积工艺已被证明能有效提高金属化层的质量和性能。