plasma ion-assisted deposition

例句：

1. 1. In theprocess of plasma ion-assisted deposition, the sample is placed in a vacuum chamber and exposed to high-energy electron beams for a short period of time.
   在等离子体辅助沉积过程中，样品被放置在真空室中，并暴露于高能电子束下短时间。
2. 2. The plasma ion-assisted deposition technique has been widely used in the semiconductor industry for itsability to improve the crystalline quality of materials.
   等离子体辅助沉积技术在半导体工业中得到了广泛应用，因为它能够提高材料的晶体质量。
3. 3.The plasma ion-assisted deposition process can be used to deposit thin films with high purity and uniformity, which are essential for many electronic devices.
   等离子体辅助沉积过程可以用来沉积纯度高且均匀的薄膜，这对于许多电子设备来说都是至关重要的。