plasma-enhanced CVD

例句：

1. 1. The process of plasma-enhanced CVD is crucial for the fabrication of high-quality semiconductor devices.
   等离子增强化学气相沉积过程对于制造高质量半导体器件至关重要。
2. 2. The development of plasma-enhanced CVD has greatly advanced the field of microelectronics.
   等离子增强化学气相沉积的发展极大地推动了微电子领域的进步。
3. 3. The plasma-enhanced CVD technique is widely used in the production of thin films and coatingsdue to its high deposition rates and uniformity.
   由于其高沉积速率和均匀性，等离子增强化学气相沉积技术广泛应用于薄膜和涂层的生产中。