reactive ion beam etching

例句：

1. 1.This process is crucial for the fabrication of micro-electronic devices.
   这个过程对于制造微电子器件至关重要。
2. 2. The reactive ion beam etching technique has been widely used in the semiconductor industry.
   活性离子束蚀刻技术在半导体工业中得到了广泛应用。
3. 3.The reactive ion beam etching process can be used to remove unwanted materials from a surface.
   活性离子束蚀刻过程可以用来从表面去除不需要的材料。