removing of photoresist by oxidation

例句：

1. 1. The process of removing photoresist is crucial for the success of the lithography process.
   去除光刻胶的过程对于光刻过程的成功至关重要。
2. 2.The oxidation method is used to remove the photoresist without damaging the underlying layer.
   使用氧化方法去除光刻胶而不损坏底层层。
3. 3. During the etching process, the photoresist is removed by oxidation to create a clean surface.
   在蚀刻过程中，通过氧化去除光刻胶以创建干净的表面。