ultra-high-vacuum physical vapor deposition

  1. 超高真空物理气相沉积

网络词典

ultra-high-vacuum physical vapor deposition

英 ˈjʊlər ˌhæv.i.wʌd.ɪ.və.sɪˈzjuː.rən 美 ˈjʊlər ˌhæv.i.wʊ.d.ɪ.və.sɪˈzjuː.rən
名词 中文翻译:超高真空物理气相沉积同义词
同义词: ['ultra-high vacuum physical vapor deposition', 'ultra-high vacuum chemical vapor deposition']

例句:

  1. 1. The process of ultra-high-vacuum physical vapor deposition is crucial for the fabricationof high-quality semiconductor devices.
    超高真空物理气相沉积过程对于制造高质量半导体器件至关重要。
  2. 2. Ultra-high-vacuum physical vapor deposition has been widely used in the field of microelectronics to achieve precise patterning and control of materials.
    在微电子领域,超高真空物理气相沉积被广泛应用,以实现对材料的精确图案化和控制。
  3. 3. In recent years, research on ultra-high-vacuum physical vapor deposition has made significant progress in materialsynthesis and device performance optimization.
    近年来,超高真空物理气相沉积的研究在材料合成和器件性能优化方面取得了显著进展。