unexposed resist

例句：

1. 1. The photoresist was exposed to UV light for 30 seconds before being developed.
   光刻胶在曝光30秒后进行显影。
2. 2.The process of developing the resist is crucial for achieving high resolution.
   显影过程对于获得高分辨率至关重要。
3. 3. The developer used in this process is a mixture of chemicals that react with the resist to form a clear image.
   用于此过程中的显影液是一种化学物质的混合物，它与抗蚀剂反应形成清晰的图像。